James Webb Space Telescope : The First Light Machine

Dr. H. Philip Stahl NASA USA

Abstract Scheduled to begin its 10 year mission no sooner than 2013, the James Webb Space Telescope (JWST) will search for the first luminous objects of the Universe to help answer fundamental questions about how the Universe came to look like it does today. At 6.5 meters in diameter, JWST will be the world’s largest space telescope. This talk reviews science objectives for JWST and how they drive the JWST architecture, e.g. aperture, wavelength range and operating temperature. Additionally, the talk provides an overview of the JWST primary mirror technology development and fabrication status.

Brief Biography Dr. H. Philip Stahl is a Senior Optical Physicist at NASA MSFC where he is the James Webb Space Telescope (JWST) Optical Components Technical Lead. Previously, Dr. Stahl was a Senior Staff Optical Engineer at Raytheon Danbury (formerly Hughes Danbury Optical Systems, now Goodrich Aerospace) where he was the lead optical engineer for the 4 meter LAMP mirror. As President of Stahl Optical Systems Inc. he supported several NASA microgravity experiments. Also, he was an Assistant Professor of Physics and Applied Optics at Rose-Hulman. Institute of Technology, the Optical Products Manager at Breault Research Organization (BRO), and a Senior Optical Systems Engineer at BRO. Prior to that, he worked at Perkin-Elmer, Hughes Aircraft, and Wright-Patterson AFB. Finally, he was a Faculty Fellow at NASA Lewis (now Glenn) Research Center. Dr. Stahl is a leading authority in optical metrology, optical engineering, and phase-measuring interferometry. Many of the world's largest telesco pes have been fabricated with the aid of high-speed and infrared phase-measuring Interferometers developed by him, including the Keck, VLT and Gemini telescopes. He is a Fellow of SPIE, an SPIE Director, an International Commission for Optics (ICO) Vice President and a member of OSA. He earned his PhD in Optical Science at the University of Arizona Optical Sciences Center in 1985.

The 42 m E-ELT (European Extremely large telescope)

Bernard Delabre European Southern Observatory (ESO) Germany

Abstract: The present concept of the E-ELT is a five mirrors, 42 m diameter telescope which includes adaptive optic for correction of the ground layer turbulences. The primary mirror is aspheric, it is composed of 906 hexagonal segments, 1.45 m each. The secondary mirror has a diameter of 5.7 m. The three additional mirrors, one concave and 2 flat are used for adaptive optic and image stabilization, they also provide access to two Nasmyth focal planes.The implementation of a Coud e focus is also foreseen for instruments which require very high stability. The five mirror approach provides a fully diffraction limited 10 arc min field of view, even down to 450 nm and is compatible with the use of laser guide stars. This paper will describe in details the optical design and the performances of the telescope. Some preliminary information of the mechanical concept will also be given.

Brief Biography Several papers on astronomical instrumentation, mainly imagers and spectrographs for the ESO Very large Telescope.

Extremely Large Telescope The Challenge of the Optics.

Eric RUCH SAGEM Défense Sécurité REOSC Department France

Abstract: The next generation of Extremely Large Telescope wi ll be a major challenge for the optical manufacturing companies worldwide. Several projects, such as the European Extremely large Telescope, the Thirty Meter Telescope, the Giant Magellan Telescope are planned to be manufactured during the next decade. The se projects will require the production of large monolithic segments or several hundreds of 2 meter class segments much faster and much more accurate than the optics produced in the 90s. Most of these new generation telescope will also require large adaptive mirror with thin shell of several meter in diameter and a few millimeters thick. And the focal planes will see new generation of instruments requiring very large lenses and filters. This paper will address these new challenges that the optical manufacturing will face during the next decade.

Brief Biography Eric Ruch is graduate in optical engineering from the Institute of Optics in Paris . Hs has joined REOSC in 1985, has work in lens design and has been project manager for several space and astronomy projects. Since 2006, he is responsible for the business development for the space and the astronomy activities of the REOSC department in SAGEM.

Optics for the Giant Magellan Telescope

Dr. Jim Burge University of Arizona USA

Abstract: The University of Arizona has started making the optics for the Giant Magellan Telescope -- an astronomical telescope with 25 meter aperture. The giant primary mirror for GMT will be made of seven smaller pieces, each 8.4 meters across. The effects of the atmosphere will be measured using laser guide stars and will be corrected in real time by deforming the 4 meter secondary mirror. The challenges of making the telescope optics are being directly addressed at the University of Arizona. This talk will summarize the design and performance of GMT and will give discuss the technology for the mirrors.

Biography: Dr. Jim Burge is Associate Professor at the University of Arizona with joint appointments at the College of Optical sciences and Steward Observatory. He has led the development of optical testing and mirror fabrication technologies that enable the production of large, highly aspheric telescope mirrors. He also leads a group of graduate researchers and teaches courses in applied optics and optomechanics.

The New UK National Facility for Ultra-Precision and Structured Surfaces

Dr. David Walker University College London UK

Abstract: This paper describes the UK programme to develop a National Facility for producing ultra-precision surfaces up to the 1m size-range and beyond. This is partly funded by the UK research councils through the university sector, and partly by industrial collaborators. The Facility is located within the technology centr e of the new OpTIC Technium building in North Wales, which also houses company incubators and business support. The driver for theprogramme is the increasing demand for medium-scale optics for a number of sectors including astronomy and high-power lasers, and the increasing demands on surface-quality and surface-complexity. State-of-the-art equipment is currently being installed and operated in the new National Facility. Processes under development comprise ultra -precision grinding, reactive atomic plasma technology, fluid-jet polishing, Precessions TM polishing and various hybrid grolishing techniques. Metrology of surfaces is key to their manufacture, and so the UK approach to this is also described, based around interferometry and contact profilometry. Overall, the Facility is developing a holistic approach considering all aspects of the optimum end-to-end manufacturing cycle.

Manufacturing of Replicated Optics for Extremely Short Wavelength Applications

Dr.Yoshiharu Namba Chubu University Japan

Abstract: The replication process is the key optical manufacturing technology for consumer’s products such as lenses of CD, DVD, digital cameras and laser printers as well as collimation optics in order to reduce the cost remarkably, particularly for making non-flat and non-spherical surfaces. Making precision dies, molding, separation and inspection are the basic processes for such optics. X-ray optics requires special demands such as aspheric mirrors of higher dimensional accuracy and very smooth surface due to shorter wavelength. X -ray microscopes need inner mirrors of small diameter. X-ray telescopes need very light weigh and large mirrors of various shapes. All such mirrors are coated with very smooth thin reflecting films. For making such X-ray optics, replication technology has been adopted. This paper deals with ultra-precision machining of electroless nickel dies, single and multi-layer coating, molding and separation for making aspheric mirrors of X-ray microscopes and telescopes. The latter case, we need the mass production of large aspheric dies in high precision, so that the electroless nickel has been adopted as the material for dies due to machinability. The dies were single-point diamond turned by ultra-precision lathes of 1nm resolution and polished into smooth surfaces less than 0.3nm rms. Such manufacturing process will help industrial needs in visible and infrared regions as the leading edge technology.

Brief Biography:Graduated from the department of precision engineering, Osaka University in 1964, Dr. of Engineering from Osaka University in 1970. Associate professor of Osaka Unive rsity from 1972 to 1987. Professor of Chubu University from 1987. Winner of David Richardson Medal from the Optical Soc iety of America in 1998. Fellow of JSME and JSPE.

High precision multilayers of imaging mirrors for diffraction-limited soft X-ray microscopes

Dr.Tadashi Hatano Tohoku University Japan

Abstract: We are developing soft X-ray microscopes using multilayer optics (M. Yamamoto et al.: Opt. Prec. Eng. 9, 405 (2001)). Our goal is an element specific imaging of organic and inorganic hybrids with a spatial resolution of 50 nm in laboratory scale. Normal incidence multilayer mirrors could reduce an aberration to nm level, as well as dilate an NA over 0.2. Though a laser produced plasma (LPP) laboratory source ( S. Nakayama et al.: Physica Scripta 41, 754 (1990)) is less brilliant than synchrotron radiation, it is suitable for imaging type microscope in combination with a multilayer objective. We have developed a multilayer fabrication system stabilized for absolute thickness control to 0.4% and a speed programmed shutter for thickness distribution control over a curved mirror substrate to 0.1%. Precise period thickness measurements were achieved at a synchrotron radiation facility (T. Hatano et al.: AIP Proc. 705, 839 (2004)). To finalize high quality imaging mirrors with a sub -nm level error, we are developing a spectro -reflectometer, an at-wavelength interferometer and a wavefront error correction system. The spectro-reflectometer is composed of an LPP source, a Monk -Gillieson type monochromator and a variable length goniometer adjustable to radius of curvatures of mirror sample s. Another LPP source with a high NA debris shutter ( M. Yamamoto et al.: Proc. Soc. Photo-Opt. Instrum. Eng. 4146, 128 (2000)) is used at the interferometer, which is of a common path type. We have proposed a wavefront correction method using a 6 reflection phase change at a wavelength of 13 nm under a single layer pair removal (M. Yamamoto: Nucl. Instrum. Methods Phys. Sec. A 467-8, 1282 (2001)). A milling equipment for this purpose is under construction.

Brief Biography: Tadashi Hatano was born in Mie, Japan in 1964. He got a PhD (sc) at the University of Tokyo in 1993. He was a research fellow from 1994 till 1996 in the Photon Factory, where he studied core MCD and soft X -ray Young’s interferometer. He moved to Tohoku University in 1996. His current interests are in phase control of soft X-rays using multilayers including interferometry, diffraction- limited imaging and polarization analysis.

Immersion and 32nm Lithography-- Now and Future –

Dr.Masaomi Kameyama Nikon Corporation Japan

Abstract: The amazing growth of the semiconductor industry over the past decades has been supported, and in many cases driven, by miniaturization of devices. Behind this has been one strong backbone - lithography. In the 1970's, devices had geometries of several micrometers, but now we are about to enter 45nm device pre -production and shortly after move it into volume-production. Immersion lithography, although having a short development time, is already in production and will become the primary technology driver. What we need to do now is identify the solutions for 32nm lithography. There are several candidates for 32 nm lithogra phy, such as EUVL, High Index Immersion and Double Patterning / Double Exposure. Other more esoteric technologies such as nanoimprint and maskless lithography have also been mentioned. In this paper, the present status of Immersion lithography will be reviewed and each of the 32nm candidates are reviewed.

Brief Biography: He received MS degree in Industrial Chemistry at Seikei University at 1975. He joined Nikon R & D Center in 1975, and then moved to Exposure Tool Designing Department in 1984. Since 1984, he has been in the center of Exposure Tool developmen ts. He is the active member of ITRS Lithography ITWG and the ex-representative of Japan Lithography TWG in 2002 - 2005.

Sub-wavelength Plasmonic Optics and its Applicatio ns to Nano-Optical Functional Elements

Dr.Xiangang Luo IOE China

Abstract: Current developments in optical technologies are being directed toward nanoscale devices with subwavelength dimensions. For most materials, light–matter interactions decrease as the structure size is below the wavelength of light. However, metals which support surface plasmon modes can concentrate electromagnetic fields to a small fraction of a wavelength while enhancing local field strengths by several orders of magnitude. For this reason, plasmonic nanostructures can overcome the diffraction of light. Thus, sub-wavelength plasmonic optics have many important applications in nanooptics. Here we review the current work in our laboratory and future prospects of sub-wavelength plasmonic optics and its applications in various fields including nano-optical sensors, nano-optical functional elements, and nanolithography.

Biography: Xiangang Luo is a Professor and the vice Director of the State Key Lab of Optical Technology for Microfabrication. He also serves as the chief scientist of National Key Basic Research and Development Program on plasmonic -materials and devices. His current research focused on plasmonics, nano-scale engineering, meta-materials, and nano-photonics and nanofabrication. He has published over 60 technical papers. He received Ph.D from Chinese Academy of Sciences.

Overview of Characterizing MEMS/NEMS

Dr.SEN HAN veeco company U.S.A

Abstract: With the development of MEMS and NEMS industries, the marketing demands on testing MEMS/NEMS devices are presented. Because MEMS/NEMS devices are manufactured using microfabrication technology similar to the batch fabrication techniques used for integrated circuits, unprecedented levels of functionality can be placed on a small silicon chip. With such complexity, and the demand for absolute repeatability, it is no surprise that quality control is one of the most crucial factors in making a successful and afford able MEMS/NEMS product. This presentation introduces overview of MEMS/NEMS testing. Then the presentation reviews the techniques of MEMS/NEMS testing, including static, dynamic and through transmissive media measurements. Finally, the presentation describes software features and MEMS applications.

Brief Biography: Dr. Sen Han, as Senior Staff Scientist, has been working at Wyko/Veeco Instrument Inc since 1997. Dr. Han is an Adjunct Professor of College of Optical Sciences, University of Arizona, USA and an Adjunct Professor of Optical Engineering, Changchun University of Science and Technology, China. From 1991 to 1997, Dr. Han was a guest researcher of Institute of Applied Optics at the University of Stuttgart, Germany. Dr. Han was involved in the design and manufacturing of the largest 24” phase shifting interferometer, LIGO interferometer and Wyko RTI series laser interferometers. Recently, Dr. led TTM project. Dr. Han won R&D100 Awards twice in 2000 and 2005, respectively. Dr. Han is a member of SPIE, OSA and ASPE, and a board member of China society of Micro/Nano-Technology.